Invention Application
- Patent Title: MANUFACTURING METHOD OF DISPLAY DEVICE
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Application No.: US17842979Application Date: 2022-06-17
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Publication No.: US20230006140A1Publication Date: 2023-01-05
- Inventor: Daiki NAKAMURA , Tomoya AOYAMA , Kensuke YOSHIZUMI
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP2021-108371 20210630
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L27/32 ; H01L51/50 ; H01L51/52 ; H01L51/56

Abstract:
A display device that can easily have high resolution is provided. A display device having both high display quality and high resolution is provided. A display device with high contrast is provided. A first EL film is deposited in contact with a top surface and a side surface of each of a first pixel electrode and a second pixel electrode each having a tapered shape. A first sacrificial film is formed to cover the first EL film. The first sacrificial film and the first EL film are etched to expose the second pixel electrode and form a first EL layer over the first pixel electrode and a first sacrificial layer over the first EL layer, and then, the first sacrificial layer is removed. The first EL film and the second EL film are etched by dry etching. The first sacrificial layer is removed by wet etching.
Public/Granted literature
- US12262623B2 Manufacturing method of display device Public/Granted day:2025-03-25
Information query
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