Invention Publication
- Patent Title: DEEP AUTO-ENCODER FOR EQUIPMENT HEALTH MONITORING AND FAULT DETECTION IN SEMICONDUCTOR AND DISPLAY PROCESS EQUIPMENT TOOLS
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Application No.: US18151156Application Date: 2023-01-06
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Publication No.: US20230153574A1Publication Date: 2023-05-18
- Inventor: Heng HAO , Sreekar BHAVIRIPUDI , Shreekant GAYAKA
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G06N3/04
- IPC: G06N3/04 ; G06N3/08 ; G05B19/418 ; G06V10/82

Abstract:
Implementations described herein generally relate to a method for detecting anomalies in time-series traces received from sensors of manufacturing tools. A server feeds a set of training time-series traces to a neural network configured to derive a model of the training time-series traces that minimizes reconstruction error of the training time-series traces. The server extracts a set of input time-series traces from one or more sensors associated with one or more manufacturing tools configured to produce a silicon substrate. The server feeds the set of input time-series traces to the trained neural network to produce a set of output time series traces reconstructed based on the model. The server calculates a mean square error between a first input time series trace of the set of input time series traces and a corresponding first output time series trace of the set of output time-series traces. The server declares the sensor corresponding to the first input time-series trace as having an anomaly when the mean square error exceeds a pre-determined value.
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