发明公开
- 专利标题: METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES
-
申请号: US18157776申请日: 2023-01-20
-
公开(公告)号: US20230161265A1公开(公告)日: 2023-05-25
- 发明人: Pioter NIKOLSKI , Thomas THEEUWES , Antonio CORRADI , Duan-Fu Stephen HSU , Sun Wook JUNG
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 优先权: EP 187251.2 2020.07.22 EP 188802.1 2020.07.31
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
Disclosed is a method of determining a process window within a process space comprising obtaining contour data relating to features to be provided to a substrate across a plurality of layers, for each of a plurality of process conditions associated with providing the features across said plurality of layers and failure mode data describing constraints on the contour data across the plurality of layers. The failure mode data is applied to the contour data to determine a failure count for each process condition; and the process window is determined by associating each process condition to its corresponding failure count. Also disclosed is a method of determining an actuation constrained subspace of the process window based on actuation constraints imposed by the plurality of actuators.
信息查询
IPC分类: