发明公开
- 专利标题: CONDUIT SYSTEM, RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
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申请号: US17912996申请日: 2021-03-09
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公开(公告)号: US20230163551A1公开(公告)日: 2023-05-25
- 发明人: Edward Siqi Luo , Thomas Dickson Steiger , Andrew Jay Effenberger, Jr. , Mohammad Amin Khamehchi
- 申请人: Cymer, LLC
- 申请人地址: US CA San Diego
- 专利权人: Cymer, LLC
- 当前专利权人: Cymer, LLC
- 当前专利权人地址: US CA San Diego
- 国际申请: PCT/US2021/021543 2021.03.09
- 进入国家日期: 2022-09-20
- 主分类号: H01S3/036
- IPC分类号: H01S3/036 ; H01S3/034 ; G03F7/20
摘要:
A pulsed-discharge radiation source includes a gas chamber, a window, and a conduit system. The conduit system includes a refill path and a conduit. The pulsed-discharge radiation source generates radiation. The gas chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the gas chamber and allows the radiation to travel between the gas chamber and the environment. The refill path allows a replacement of the gas. The conduit circulates the gas to or from the gas chamber during the generating. The conduit system directs a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window, whereby the conduit system increases the usable lifetime of at least the window.
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