Invention Publication
- Patent Title: PIEZOELECTRIC THIN FILM AND METHODS OF FABRICATION THEREOF
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Application No.: US17920738Application Date: 2021-04-16
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Publication No.: US20230166981A1Publication Date: 2023-06-01
- Inventor: Moaz WAQAR , John WANG , Stephen John PENNYCOOK , Haijun WU , Kui YAO , Huajun LIU
- Applicant: National University of Singapore , Agency for Science, Technology and Research
- Applicant Address: SG Singapore
- Assignee: National University of Singapore,Agency for Science, Technology and Research
- Current Assignee: National University of Singapore,Agency for Science, Technology and Research
- Current Assignee Address: SG Singapore
- Priority: SG 202003767Q 2020.04.24
- International Application: PCT/SG2021/050218 2021.04.16
- Date entered country: 2022-10-21
- Main IPC: C01G33/00
- IPC: C01G33/00 ; H10N30/00 ; H10N30/853 ; H10N30/076

Abstract:
The present invention relates, in general terms, to piezoelectric thin films with an empirical formula (K1xNax)yNbO3, wherein 0≤x≤1 and 0.64≤y≤0.95. In particular, the piezoelectric thin film comprises at least two adjacent NbO2 planes in an antiphase boundary, the at least two adjacent NbO2 planes displaced from each other by about half a lattice length in either the (100), (010) or (100) crystallographic plane. The present invention also relates to methods of fabricating the piezoelectric thin films.
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