Invention Publication
- Patent Title: MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
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Application No.: US18062080Application Date: 2022-12-06
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Publication No.: US20230185208A1Publication Date: 2023-06-15
- Inventor: SATORU JIMBO , KAZUHIKO MISHIMA
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Priority: JP 21201173 2021.12.10
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G06T7/73 ; G06T7/00

Abstract:
A measurement apparatus that measures position information of a measurement target is provided. The apparatus includes a scope configured to generate an image by capturing an image of the measurement target, and a processor configured to obtain position information of the measurement target based on the image. The processor is configured to generate a plurality of image components using a statistical technique from a plurality of images generated by the scope, output the plurality of generated image components, perform processing based on the plurality of image components, and determine the position information based on a result of the processing.
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