- 专利标题： THERMALLY STABLE RUTHENIUM PRECURSOR COMPOSITION, AND METHOD FOR FORMING RUTHENIUM-CONTAINING FILM
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申请号： US18133003申请日： 2023-04-11
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公开(公告)号： US20230242560A1公开(公告)日： 2023-08-03
- 发明人: Wonyong KOH , Jin Sik KIM , Dae-Young KIM
- 申请人： UP CHEMICAL CO., LTD.
- 申请人地址： KR Pyeongtaek-si
- 专利权人： UP CHEMICAL CO., LTD.
- 当前专利权人： UP CHEMICAL CO., LTD.
- 当前专利权人地址： KR Pyeongtaek-si
- 优先权： KR 20200131063 2020.10.12
- 主分类号： C07F15/00
- IPC分类号： C07F15/00 ; C23C16/455 ; C23C16/18
摘要：
The present application relates to: a ruthenium precursor compound for forming a film having high thermal stability; a precursor composition for forming a film, comprising the ruthenium precursor compound; and a method for forming a ruthenium-containing film using the precursor for forming a film.
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