NOVEL RESIN SUITABLE FOR STEREOLITHOGRAPHIC PRINTING USING POLY(1,1-DIFLUOROETHYLENE)
摘要:
A photocurable resin composition is provided that is suitable for use in stereolithography, comprising from about 2 weight percent to about 75 weight percent of a fluoropolymer, particularly poly(1,1-difluoroethylene), or an aromatic engineering thermoplastic polymer, a sulfur-based engineering thermoplastic polymer, a fluorine-based engineering thermoplastic polymer, or a commodity thermoplastic polymer. Also provided is a process for making three dimensional objects from successive layers of the photocurable resin composition described herein.
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