- 专利标题： METHODS OF FORMING SUPERLATTICE STRUCTURES USING NANOPARTICLES
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申请号： US18304067申请日： 2023-04-20
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公开(公告)号： US20230352300A1公开(公告)日： 2023-11-02
- 发明人: Jan Deckers
- 申请人： ASM IP Holding, B.V.
- 申请人地址： NL Almere
- 专利权人： ASM IP Holding, B.V.
- 当前专利权人： ASM IP Holding, B.V.
- 当前专利权人地址： NL Almere
- 主分类号： C30B25/16
- IPC分类号： C30B25/16 ; C30B29/06 ; C30B29/52 ; C30B29/68 ; H01L21/02 ; C30B33/12
摘要：
Methods and systems for forming structures including a superlattice of silicon-containing epitaxial layers using nanoparticles. Exemplary methods can include forming nanoparticles in situ and depositing the nanoparticles onto a substrate surface to thereby form the epitaxial layers.
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