发明公开
- 专利标题: METHOD FOR PREPARING ELECTRODE FILM LAYER ON SURFACE OF SOLAR CELL SUBSTRATE
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申请号: US18449506申请日: 2023-08-14
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公开(公告)号: US20230387342A1公开(公告)日: 2023-11-30
- 发明人: Ping Xiao , Jiguang Xiong , Zhiguo Zhao , Jialiang Liu , Mengjie Li , Dongming Zhao , Xiaojun Qin , Yun Zhang , Chao Dong , Xueling Wang , Shisen Xu , Ruwei Liu , Sichao Liang
- 申请人: Huaneng Clean Energy Research Institute
- 申请人地址: CN Beijing
- 专利权人: Huaneng Clean Energy Research Institute
- 当前专利权人: Huaneng Clean Energy Research Institute
- 当前专利权人地址: CN Beijing
- 优先权: CN 2111198189.6 2021.10.14
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H01L31/0224 ; H01L31/032
摘要:
The disclosure provides a method for preparing an electrode film layer on a surface of a solar cell substrate. The method includes: a) obtaining a metal electrode material melt by heating and melting a metal electrode material under a vacuum condition; b) bombarding the metal electrode material melt with an ion source at low energy, so that it is sputtered and deposited on the surface of the solar cell substrate to form the electrode film layer; in which the energy of low energy bombarding is 30 eV to 80 eV.
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