Invention Application
- Patent Title: PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
-
Application No.: US17792464Application Date: 2020-12-15
-
Publication No.: US20230050613A1Publication Date: 2023-02-16
- Inventor: Ties Wouter VAN DER WOORD , Volker Dirk HILDENBRAND , Inci DONMEZ NOYAN , Adrianus Johannes Maria GIESBERS , Alexander Ludwig KLEIN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP20152141.6 20200116,EP20179484.9 20200611,EP20193717.4 20200831
- International Application: PCT/EP2020/086067 WO 20201215
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F7/20
Abstract:
A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.
Information query
