- 专利标题: OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM
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申请号: US17796640申请日: 2021-01-21
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公开(公告)号: US20230059471A1公开(公告)日: 2023-02-23
- 发明人: Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Stephen ROUX , Yevgeniy Konstantinovich SHMAREV
- 申请人: ASML Holding N.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Holding N.V.
- 当前专利权人: ASML Holding N.V.
- 当前专利权人地址: NL Veldhoven
- 国际申请: PCT/EP2021/051340 WO 20210121
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00
摘要:
A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
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