Invention Application
- Patent Title: OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM
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Application No.: US17796640Application Date: 2021-01-21
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Publication No.: US20230059471A1Publication Date: 2023-02-23
- Inventor: Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Stephen ROUX , Yevgeniy Konstantinovich SHMAREV
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2021/051340 WO 20210121
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00

Abstract:
A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
Public/Granted literature
- US12140872B2 Optical designs of miniaturized overlay measurement system Public/Granted day:2024-11-12
Information query
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