Invention Application
- Patent Title: IMPURITY PROCESSING DEVICE AND IMPURITY PROCESSING METHOD
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Application No.: US17801188Application Date: 2021-01-21
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Publication No.: US20230102372A1Publication Date: 2023-03-30
- Inventor: Miyuki Nakai , Yuko Ogawa , Toshiro Kume
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka-shi, Osaka
- Priority: JP2020-028257 20200221
- International Application: PCT/JP2021/001965 WO 20210121
- Main IPC: H01M4/04
- IPC: H01M4/04 ; B03C5/02
Abstract:
An impurity processing device includes: a pipe through which a treated liquid containing metal impurities flows; a first electrode and a second electrode disposed in the pipe; and a power supply causing a current to flow between the first electrode and the second electrode.
Information query
