- 专利标题: DEVICE LAYOUT DESIGN FOR IMPROVING DEVICE PERFORMANCE
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申请号: US17672325申请日: 2022-02-15
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公开(公告)号: US20230120292A1公开(公告)日: 2023-04-20
- 发明人: Shih-Pang Chang , Haw-Yun Wu , Yao-Chung Chang , Chun-Lin Tsai
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/528
- IPC分类号: H01L23/528 ; H01L29/417 ; H01L29/423 ; H01L29/40 ; H01L23/522
摘要:
The present disclosure relates an integrated chip. The integrated chip includes an isolation region disposed within a substrate and surrounding an active area. A gate structure is disposed over the substrate and has a base region and a gate extension finger protruding outward from a sidewall of the base region along a first direction to past opposing sides of the active area. A source contact is disposed within the active area and a drain contact is disposed within the active area and is separated from the source contact by the gate extension finger. A first plurality of conductive contacts are arranged on the gate structure and separated along the first direction. The first plurality of conductive contacts are separated by distances overlying the gate extension finger.
公开/授权文献
- US12046554B2 Device layout design for improving device performance 公开/授权日:2024-07-23
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