- 专利标题: RESPIRATOR FACE MASKS FOR PROTECTION FROM AIRBORNE PARTICLES
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申请号: US17914004申请日: 2021-03-25
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公开(公告)号: US20230129150A1公开(公告)日: 2023-04-27
- 发明人: Crystal NYITRAY , Grace WEI
- 申请人: ENCELLIN, INC.
- 申请人地址: US CA San Francisco
- 专利权人: ENCELLIN, INC.
- 当前专利权人: ENCELLIN, INC.
- 当前专利权人地址: US CA San Francisco
- 国际申请: PCT/US2021/024131 WO 20210325
- 主分类号: A61L9/012
- IPC分类号: A61L9/012 ; A41D13/11 ; A61L9/014 ; A62B23/02 ; B01D46/54 ; B01D71/06 ; B01D69/12 ; B01D69/02
摘要:
The present disclosure provides a filtration media for filtering one or more airborne particles. The filtration media may comprise a membrane comprising one or more polymeric layers to filter the airborne particles. The filtration media may have high filtration efficiency and high breathability. Additionally, the present disclosure provides devices (e.g., face masks) comprising the filtration media which may be used to filter airborne particles (e.g., bacteria, viruses) and to protect the wearer (e.g., from infection).
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