- 专利标题： Nanostructure platform for cellular interfacing and corresponding manufacturing method
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申请号： US18254881申请日： 2021-12-03
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公开(公告)号： US20240011940A1公开(公告)日： 2024-01-11
- 发明人: Guilhem LARRIEU
- 申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- 申请人地址： FR Paris Cedex 16
- 专利权人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- 当前专利权人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- 当前专利权人地址： FR Paris Cedex 16
- 优先权： FR 12720 2020.12.04 FR 11269 2021.10.22
- 国际申请： PCT/EP2021/084283 2021.12.03
- 进入国家日期： 2023-05-30
- 主分类号： G01N27/414
- IPC分类号： G01N27/414
摘要：
The invention relates to a method for manufacturing a platform for cellular interfacing, the platform being manufactured over a predetermined bulk substrate, the method being a top-down method.
According to the invention, such a method comprises the following steps in order:
creating (E10) vertical nanowires over the bulk substrate;
depositing (E30) a Si layer
creating (E40) the access lines for accessing the nanowires;
selective silicidation (E50) of the access lines and of the nanowires;
metal structuring (E60) of the access lines;
depositing (E60) an insulating layer for liquid measurement;
selective removal (E70) of the insulating layer on the nanoprobes.
According to the invention, such a method comprises the following steps in order:
creating (E10) vertical nanowires over the bulk substrate;
depositing (E30) a Si layer
creating (E40) the access lines for accessing the nanowires;
selective silicidation (E50) of the access lines and of the nanowires;
metal structuring (E60) of the access lines;
depositing (E60) an insulating layer for liquid measurement;
selective removal (E70) of the insulating layer on the nanoprobes.
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