Invention Publication
- Patent Title: TRAINING METHODS FOR MACHINE LEARNING ASSISTED OPTICAL PROXIMITY ERROR CORRECTION
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Application No.: US18233365Application Date: 2023-08-14
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Publication No.: US20240012335A1Publication Date: 2024-01-11
- Inventor: Jing Su , Yen-Wen Lu , Ya Luo
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G06N20/00 ; G06N5/047
Abstract:
A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.
Public/Granted literature
- US12204250B2 Training methods for machine learning assisted optical proximity error Public/Granted day:2025-01-21
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