A measurement system for measuring a status of a process of a treatment apparatus for treating a component in a chamber to generate a gas mixture including gaseous phase materials includes a sampling unit configured to selectively communicate an exhaust pipe for discharging the gas mixture including the gaseous phase materials from the chamber to sample the gas mixture from the exhaust pipe as much as a predetermined time or a predetermined volume; and a detection unit configured to separate and detect the gaseous phase materials included in the gas mixture sampled by the sampling unit into substances.