Invention Publication
- Patent Title: FULLY AUTOMATED SEM SAMPLING SYSTEM FOR E-BEAM IMAGE ENHANCEMENT
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Application No.: US18365134Application Date: 2023-08-03
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Publication No.: US20240046620A1Publication Date: 2024-02-08
- Inventor: Wentian ZHOU , Liangjiang YU , Teng WANG , Lingling PU , Wei FANG
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G06V10/774
- IPC: G06V10/774 ; G06T7/00 ; G06F18/214 ; G06V10/776 ; G06V10/98

Abstract:
Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.
Public/Granted literature
- US12230013B2 Fully automated SEM sampling system for e-beam image enhancement Public/Granted day:2025-02-18
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