- 专利标题: METAL CHALCOGENIDE FILM, MEMORY ELEMENT INCLUDING SAME, AND METHOD FOR MANUFACTURING PHASE-CHANGE HETEROLAYER
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申请号: US18348846申请日: 2023-07-07
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公开(公告)号: US20240057347A1公开(公告)日: 2024-02-15
- 发明人: Wooyoung YANG , Hyungjun Kim , Hajun Sung , Kiyeon Yang , Changseung Lee , Changyup Park , Seung-min Chung , Sangyoon Lee , Inkyu Sohn
- 申请人: Samsung Electronics Co., Ltd. , UIF (University Industry Foundation), Yonsei University
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.,UIF (University Industry Foundation), Yonsei University
- 当前专利权人: Samsung Electronics Co., Ltd.,UIF (University Industry Foundation), Yonsei University
- 当前专利权人地址: KR Suwon-si; KR Seoul
- 优先权: KR 20220099432 2022.08.09
- 主分类号: H10B63/10
- IPC分类号: H10B63/10 ; H10N70/20 ; H10N70/00 ; H10B63/00
摘要:
A memory element includes a substrate, a first electrode formed on the substrate, a phase-change heterolayer formed on the first electrode and electrically connected to the first electrode, and a second electrode formed on the phase-change heterolayer, wherein the phase-change heterolayer includes one or more confinement material layers and one or more phase-change material layers, and the confinement material layer includes a metal chalcogenide film.
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