Invention Publication
- Patent Title: METAL CHALCOGENIDE FILM, MEMORY ELEMENT INCLUDING SAME, AND METHOD FOR MANUFACTURING PHASE-CHANGE HETEROLAYER
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Application No.: US18348846Application Date: 2023-07-07
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Publication No.: US20240057347A1Publication Date: 2024-02-15
- Inventor: Wooyoung YANG , Hyungjun Kim , Hajun Sung , Kiyeon Yang , Changseung Lee , Changyup Park , Seung-min Chung , Sangyoon Lee , Inkyu Sohn
- Applicant: Samsung Electronics Co., Ltd. , UIF (University Industry Foundation), Yonsei University
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.,UIF (University Industry Foundation), Yonsei University
- Current Assignee: Samsung Electronics Co., Ltd.,UIF (University Industry Foundation), Yonsei University
- Current Assignee Address: KR Suwon-si; KR Seoul
- Priority: KR 20220099432 2022.08.09
- Main IPC: H10B63/10
- IPC: H10B63/10 ; H10N70/20 ; H10N70/00 ; H10B63/00

Abstract:
A memory element includes a substrate, a first electrode formed on the substrate, a phase-change heterolayer formed on the first electrode and electrically connected to the first electrode, and a second electrode formed on the phase-change heterolayer, wherein the phase-change heterolayer includes one or more confinement material layers and one or more phase-change material layers, and the confinement material layer includes a metal chalcogenide film.
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