Invention Publication
- Patent Title: APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
-
Application No.: US18477213Application Date: 2023-09-28
-
Publication No.: US20240071711A1Publication Date: 2024-02-29
- Inventor: Xuerang HU , Weiming REN , Xuedong LIU , Zhong-wei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/12 ; H01J37/26

Abstract:
Disclosed herein is an apparatus comprising: a first electrically conductive layer, a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the eclectically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.
Public/Granted literature
- US12237144B2 Apparatus using multiple beams of charged particles Public/Granted day:2025-02-25
Information query