- 专利标题: SYSTEM AND METHOD FOR FABRICATING POLARIZATION HOLOGRAMS
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申请号: US18513487申请日: 2023-11-17
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公开(公告)号: US20240085602A1公开(公告)日: 2024-03-14
- 发明人: Xiayu FENG , Sawyer MILLER , Mengfei WANG , Stephen CHOI , Lu LU , Barry David SILVERSTEIN
- 申请人: Meta Platforms Technologies, LLC
- 申请人地址: US CA Menlo Park
- 专利权人: Meta Platforms Technologies, LLC
- 当前专利权人: Meta Platforms Technologies, LLC
- 当前专利权人地址: US CA Menlo Park
- 主分类号: G02B5/18
- IPC分类号: G02B5/18 ; G02B5/32
摘要:
A system is provided for generating a polarization interference pattern. The system includes a light source configured to output a first beam having a predetermined wavelength. The system includes a transmissive polarization volume hologram (“PVH”) mask configured to provide a predetermined diffraction efficiency to a second beam having the predetermined wavelength, a circular polarization, and a non-zero incident angle at the transmissive PVH mask. The system includes a light deflecting element disposed between the light source and the transmissive PVH mask, and configured to deflect the first beam as the second beam toward the transmissive PVH mask. The transmissive PVH mask is configured to forwardly diffract the second beam incident thereon as a third beam and a fourth beam having orthogonal circular polarizations, a substantially same light intensity, and symmetric propagation directions. The third beam and the fourth beam interfere with one another to generate the polarization interference pattern.
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