- 专利标题： PHOTOLITHOGRAPHY MASK AND PHOTOLITHOGRAPHY SYSTEM COMPRISING SAID PHOTOLITHOGRAPHY MASK
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申请号： US18263105申请日： 2022-03-31
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公开(公告)号： US20240085776A1公开(公告)日： 2024-03-14
- 发明人: Richard BEAUDRY
- 申请人： TECHNOLOGIES DIGITHO INC.
- 申请人地址： CA GRANBY
- 专利权人： TECHNOLOGIES DIGITHO INC.
- 当前专利权人： TECHNOLOGIES DIGITHO INC.
- 当前专利权人地址： CA GRANBY
- 国际申请： PCT/CA2022/050491 2022.03.31
- 进入国家日期： 2023-07-26
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G01B9/02001 ; G03F1/42
摘要：
A photolithography mask (10) is provided, said photolithography mask (10) including a plate (15) or an empty frame matrix, a surface of the plate (15) or empty frame matrix including an array of micro-pixels (20), wherein each micro-pixel (20) is independently controllable using an on-board micro-controller (25) in such a manner that a pattern can be generated with the array of micro-pixels (20).
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