- 专利标题: Atomically Precise Nanostructures and Applications Thereof
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申请号: US17936122申请日: 2022-09-28
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公开(公告)号: US20240105395A1公开(公告)日: 2024-03-28
- 发明人: Olanrewaju Tanimola
- 申请人: Olanrewaju Tanimola
- 申请人地址: US TX Sugar land
- 专利权人: Olanrewaju Tanimola
- 当前专利权人: Olanrewaju Tanimola
- 当前专利权人地址: US TX Sugar land
- 主分类号: H01G11/26
- IPC分类号: H01G11/26 ; B82B3/00
摘要:
The present invention is a method for fabricating clean technology products. It discloses composition comprising: a network of one or more nanostructures having a lattice structure formed by (ASU)n, ASU is asymmetric unit, n>0, the one or more nanostructures of the present invention comprise a selection from the group consisting of 0D, 1D, 2D, carbon, inorganic, and any combinations thereof, the lattice structure of the present invention is selected from a cubic system, a rhombohedral system, an orthorhombic system, monoclinic system, and triclinic system, where ASU is selected from (HwTxLyMz) H is hydrogen, T is an alkaline metal, L is a chalcogen, O is oxygen, w>=0, x>=1, y>=1, z>=0.
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