- 专利标题: COMPOSITE GATE DIELECTRIC FOR HIGH-VOLTAGE DEVICE
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申请号: US18150266申请日: 2023-01-05
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公开(公告)号: US20240113187A1公开(公告)日: 2024-04-04
- 发明人: Jhu-Min Song , Ying-Chou Chen , Yi-Kai Ciou , Chien-Chih Chou , Fei-Yun Chen , Yu-Chang Jong , Chi-Te Lin
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L21/8234 ; H01L27/088
摘要:
The present disclosure relates to an integrated chip. The integrated chip includes a substrate having one or more interior surfaces forming a recess within an upper surface of the substrate. Source/drain regions are disposed within the substrate on opposing sides of the recess. A first gate dielectric is arranged along the one or more interior surfaces forming the recess, and a second gate dielectric is arranged on the first gate dielectric and within the recess. A gate electrode is disposed on the second gate dielectric. The second gate dielectric includes one or more protrusions that extend outward from a recessed upper surface of the second gate dielectric and that are arranged along opposing sides of the second gate dielectric.
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