Invention Publication
- Patent Title: HUMIDITY SENSITIVE NANO-PHOTONICS AND MANUFACTURING METHOD THEREOF
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Application No.: US18378236Application Date: 2023-10-10
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Publication No.: US20240125974A1Publication Date: 2024-04-18
- Inventor: Jun Suk RHO , Byoung Su KO , Young Hwan YANG , Jae Kyoung KIM , Trevon Badloe
- Applicant: POSTECH Academy-Industry Foundation
- Applicant Address: KR Pohang-si
- Assignee: POSTECH Academy-Industry Foundation
- Current Assignee: POSTECH Academy-Industry Foundation
- Current Assignee Address: KR Pohang-si
- Priority: KR 20220130474 2022.10.12 KR 20230028487 2023.03.03
- Main IPC: G02B1/00
- IPC: G02B1/00 ; B82Y20/00 ; B82Y40/00 ; G02B1/04 ; G02F1/01 ; G03H1/00

Abstract:
The present disclosure relates to humidity sensitive nano-photonics and a manufacturing method thereof, and more particularly to humidity sensitive nano-photonics including a metasurface and a method for manufacturing the same.
The humidity sensitive nano-photonics and the manufacturing method thereof according to an embodiment of the present disclosure include a metasurface that are capable of expanding and contracting depending on changes in the relative humidity of the surrounding environment, and have the advantage of being easily manufactured, mass-produced at low cost, capable of effectively adjusting the phase and intensity of light, and applicable to various materials and various shapes of surfaces as well.
The humidity sensitive nano-photonics and the manufacturing method thereof according to an embodiment of the present disclosure include a metasurface that are capable of expanding and contracting depending on changes in the relative humidity of the surrounding environment, and have the advantage of being easily manufactured, mass-produced at low cost, capable of effectively adjusting the phase and intensity of light, and applicable to various materials and various shapes of surfaces as well.
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B1/00 | 按制造材料区分的光学元件;用于光学元件的光学涂层 |