Invention Publication
- Patent Title: SUBSTRATE INTEGRATED WITH PASSIVE DEVICES AND MANUFACTURING METHOD THEREOF
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Application No.: US17772272Application Date: 2021-04-23
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Publication No.: US20240145321A1Publication Date: 2024-05-02
- Inventor: Chuncheng CHE , Feng LIU , Yuelei XIAO , Yue LI , Guochen DU , Xue CAO , Yifan WU , Wenbo CHANG
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , Beijing BOE Sensor Technology Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,Beijing BOE Sensor Technology Co., Ltd.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,Beijing BOE Sensor Technology Co., Ltd.
- Current Assignee Address: CN Beijing
- International Application: PCT/CN2021/089225 2021.04.23
- Date entered country: 2022-04-27
- Main IPC: H01L23/15
- IPC: H01L23/15 ; H01F41/04 ; H01L23/522

Abstract:
A substrate integrated with passive devices and a manufacturing method thereof are provided. The manufacturing method of the substrate integrated with passive devices includes: providing a transparent dielectric layer with first connection vias therein, wherein the transparent dielectric layer includes a first surface and a second surface, which are opposite to each other along a thickness direction of the transparent dielectric layer; integrating the passive devices onto the transparent dielectric layer, wherein the passive devices include at least an inductor, the integrating the passive devices onto the transparent dielectric layer includes: forming first sub-structures on the first surface of the transparent dielectric layer, forming second sub-structures on the second surface, and forming first connection electrodes in the first connection vias, respectively; wherein the first sub-structures, the first connection electrodes and the second sub-structures are connected together to form a coil structure of the inductor.
Information query
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