Invention Publication
- Patent Title: TRIFLUOROACETYL IODIDE COMPOSITIONS USEFUL FOR MAKING TRIFLUOROIODOMETHANE
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Application No.: US18400050Application Date: 2023-12-29
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Publication No.: US20240166677A1Publication Date: 2024-05-23
- Inventor: Haiyou Wang , Haridasan K. Nair , Daniel C. Merkel , Selma Bektesevic , Terris Yang
- Applicant: Honeywell International Inc.
- Applicant Address: US NC Charlotte
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NC Charlotte
- Main IPC: C07F13/00
- IPC: C07F13/00

Abstract:
The present disclosure provides a composition including trifluoroacetyl iodide, at least one organic impurity and at least one inorganic impurity. The at least one organic impurity includes at least one of: difluoroiodomethane, pentafluoroiodoethane, iodomethane, iodopropane, dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, methyltrifluoroacetate, trifluoroacetic anhydride, difluorobutane and methyl propane. The at least one inorganic impurity includes at least one of: hydrogen iodide, hydrogen chloride, iodine and hydrogen triiodide.
Public/Granted literature
- US12258357B2 Trifluoroacetyl iodide compositions useful for making trifluoroiodomethane Public/Granted day:2025-03-25
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