Invention Publication
- Patent Title: High Quality Factor Metasurfaces for Wavefront Manipulation
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Application No.: US18516490Application Date: 2023-11-21
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Publication No.: US20240168358A1Publication Date: 2024-05-23
- Inventor: Claudio U. Hail , Morgan D. Foley , Ruzan Sokhoyan , Lior Michaeli , Harry A. Atwater
- Applicant: California Institute of Technology
- Applicant Address: US CA Pasadena
- Assignee: California Institute of Technology
- Current Assignee: California Institute of Technology
- Current Assignee Address: US CA Pasadena
- Main IPC: G02F1/19
- IPC: G02F1/19
Abstract:
Systems and methods for optical nanostructures that use the interference of high order Mie resonances to locally control wavefront with high quality factor in two dimensions are described. The high-order Mie-resonant metasurfaces can be used to create band-stop filters, beam deflectors, lenses, beam splitters and holograms with high quality factor.
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