Invention Publication
- Patent Title: METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC
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Application No.: US18533109Application Date: 2023-12-07
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Publication No.: US20240168388A1Publication Date: 2024-05-23
- Inventor: Simon Gijsbert Josephus MATHIJSSEN , Kaustuve BHATTACHARYYA
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP 160404.8 2020.03.02 EP 161969.9 2020.03.10
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining, from the at least one intensity distribution, an intensity indicator expressing a variation of either intensity over the at least one diffraction order, or a difference in intensity between two complimentary diffraction orders over the intensity image; and inferring the value for the at least one local uniformity metric from the intensity indicator.
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