Invention Publication
- Patent Title: INTEGRATED CIRCUIT COMPRISING A SINGLE PHOTON AVALANCHE DIODE AND CORRESPONDING MANUFACTURING METHOD
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Application No.: US18588656Application Date: 2024-02-27
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Publication No.: US20240194815A1Publication Date: 2024-06-13
- Inventor: Denis RIDEAU , Dominique GOLANSKI , Alexandre LOPEZ , Gabriel MUGNY
- Applicant: STMicroelectronics (Crolles 2) SAS , STMicroelectronics (Research & Development) Limited
- Applicant Address: FR Crolles
- Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics (Research & Development) Limited
- Current Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics (Research & Development) Limited
- Current Assignee Address: FR Crolles; GB Marlow
- Priority: FR 12999 2020.12.10
- Main IPC: H01L31/107
- IPC: H01L31/107 ; H01L31/18

Abstract:
A single photon avalanche diode (SPAD) includes a PN junction in a semiconductor well doped with a first type of dopant. The PN junction is formed between a first region doped with the first type of dopant and a second region doped with a second type of dopant opposite to the first type of dopant. The first doped region is shaped so as to incorporate local variations in concentration of dopants that are configured, in response to a voltage between the second doped region and the semiconductor well that is greater than or equal to a level of a breakdown voltage of the PN junction, to generate a monotonic variation in the electrostatic potential between the first doped region and the semiconductor well.
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