- 专利标题: IMPRINT LITHOGRAPHY PROCESS AND METHODS ON CURVED SURFACES
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申请号: US18556865申请日: 2022-04-28
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公开(公告)号: US20240198578A1公开(公告)日: 2024-06-20
- 发明人: Vikramjit SINGH , Frank Y. XU
- 申请人: Magic Leap, Inc.
- 申请人地址: US FL Plantation
- 专利权人: Magic Leap, Inc.
- 当前专利权人: Magic Leap, Inc.
- 当前专利权人地址: US FL Plantation
- 国际申请: PCT/US2022/071986 2022.04.28
- 进入国家日期: 2023-10-23
- 主分类号: B29C59/02
- IPC分类号: B29C59/02 ; B29C33/58 ; B29L11/00 ; G02B6/26 ; G02B27/01
摘要:
Methods for creating a pattern on a curved surface and an optical structure (e.g., curved waveguide, a lens having an antireflective feature, an optical structure of a wearable head device) are disclosed. In some embodiments, the method comprises: depositing a patterning material on a curved surface; positioning a superstrate over the patterning material, the superstrate comprising a template for creating the pattern; applying, using the patterning material, a force between the curved surface and the superstrate; curing the patterning material, wherein the cured patterning material comprises the pattern; and removing the superstrate. In some embodiments, the method comprises forming the optical structure using the pattern.
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