IMPRINT LITHOGRAPHY PROCESS AND METHODS ON CURVED SURFACES
摘要:
Methods for creating a pattern on a curved surface and an optical structure (e.g., curved waveguide, a lens having an antireflective feature, an optical structure of a wearable head device) are disclosed. In some embodiments, the method comprises: depositing a patterning material on a curved surface; positioning a superstrate over the patterning material, the superstrate comprising a template for creating the pattern; applying, using the patterning material, a force between the curved surface and the superstrate; curing the patterning material, wherein the cured patterning material comprises the pattern; and removing the superstrate. In some embodiments, the method comprises forming the optical structure using the pattern.
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