Invention Publication
- Patent Title: BIMOLECULAR BLOCK POLYMER AND ELECTROLYTE AND ELECTRICAL DOUBLE LAYER CAPACITOR CONTAINING THE SAME
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Application No.: US18190071Application Date: 2023-03-25
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Publication No.: US20240209151A1Publication Date: 2024-06-27
- Inventor: Yueh-Wei Lin , Chia-Chen Fang , Chun-Lung Li , Kun-Ping Huang
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW 1148832 2022.12.20
- Main IPC: C08G73/08
- IPC: C08G73/08 ; C08G81/00 ; H01G11/62 ; H01G11/64

Abstract:
Provided are a bimolecular block polymer and an electrolyte and an electrical double layer capacitor containing the same. The bimolecular block polymer is suitable for an electrolyte of a capacitor, and is formed by polymerizing a first compound and a second compound. The first compound is represented by one of formula (A-1) to formula (A-4). The second compound is represented by one of formula (B-1) to formula (B-5). A molar ratio of the first compound to the second compound is between 5:1 and 1:5.
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