Invention Publication
- Patent Title: INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL ILLUMINATION WITH APERTURE APODIZATION
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Application No.: US18568585Application Date: 2022-05-24
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Publication No.: US20240272058A1Publication Date: 2024-08-15
- Inventor: Michal Emanuel PAWLOWSKI , Justin Lloyd KREUZER
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2022/064098 2022.05.24
- Date entered country: 2023-12-08
- Main IPC: G01N15/0205
- IPC: G01N15/0205 ; G01N15/075 ; G03F7/00

Abstract:
An inspection system includes a projection system including a radiation source configured to transmit an illumination beam along an illumination path and an aperture stop configured to select a portion of the illumination beam. The inspection system also includes an aperture stop that selects a portion of the illumination beam and an optical system that transmits the selected portion of the illumination beam towards an object and transmit a signal beam scattered from the object. The inspection system also includes a detector that detects the signal beam.
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