Proposed is a pellicle for extreme ultraviolet (EUV) lithography based on a nanotube and having good optical properties, thermal stability, mechanical stability and chemical durability. The pellicle may include a frame having an opening formed in a central portion, and a pellicle membrane supported by the frame and covering the opening. The pellicle membrane may be formed in a reticular structure based on nanotubes, and include a coating layer formed by coating at least part of the nanotubes with a metal or metal compound. The metal or metal compound may be based on at least one of Mo, Si, Zr, Nb, Ru, Y, La, or Ce, or any alloy thereof.