Invention Publication
- Patent Title: R-T-B BASED PERMANENT MAGNET
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Application No.: US18607699Application Date: 2024-03-18
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Publication No.: US20240331899A1Publication Date: 2024-10-03
- Inventor: Ikuya KOKAWA , Yoshinori Fujikawa , Takahiro Suwa , Wakako Okawa
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP 23058424 2023.03.31 JP 23200937 2023.11.28
- Main IPC: H01F1/057
- IPC: H01F1/057 ; B22F3/16 ; B22F3/24 ; B22F9/02 ; B22F9/04 ; C22C38/00 ; C22C38/06 ; C22C38/10 ; C22C38/14 ; C22C38/16
Abstract:
An R-T-B based permanent magnet comprises main phases each comprising a core and a shell, and a grain boundary phase adjacent to the main phases. The shell comprises Tb. The shell has a thickness of 70 nm or more. The shell has a Tb concentration with a maximum of 1.7 at % or more.
Information query
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