Invention Publication
- Patent Title: METHOD FOR OPTICAL WRITING IN A SEMICONDUCTOR MATERIAL, CORRESPONDING COMPUTER PROGRAM PRODUCT, STORING MEDIUM AND WRITING DEVICE
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Application No.: US18577707Application Date: 2022-07-07
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Publication No.: US20240342826A1Publication Date: 2024-10-17
- Inventor: David GROJO , Andong WANG , Amlan DAS
- Applicant: UNIVERSITÉ D'AIX-MARSEILLE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
- Applicant Address: FR Marseille
- Assignee: UNIVERSITÉ D'AIX-MARSEILLE,CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
- Current Assignee: UNIVERSITÉ D'AIX-MARSEILLE,CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
- Current Assignee Address: FR Marseille
- Priority: EP 184898.1 2021.07.09
- International Application: PCT/EP2022/068835 2022.07.07
- Date entered country: 2024-01-09
- Main IPC: B23K26/0622
- IPC: B23K26/0622 ; B23K26/06 ; B23K26/352 ; B23K26/402 ; B23K101/40
Abstract:
The invention relates to an optical writing method in a semiconductor material (10), the method comprising laser writing in volume of the semiconductor material. The method comprises, prior to laser writing, irradiating the semiconductor material (10) with at least one laser pre-pulse configured to change transiently and locally one property of the semiconductor material (10).
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