Invention Application
- Patent Title: DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE
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Application No.: US18788332Application Date: 2024-07-30
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Publication No.: US20240393679A1Publication Date: 2024-11-28
- Inventor: Kun-Lung Hsieh , Tzu Han Liu , Hao-En Luo , Chih-Wei Wen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F1/64

Abstract:
In pellicle cleaning, a gas is flowed on a pellicle using at least one gas nozzle. During the flowing, the pellicle is moved respective to the at least one gas nozzle. During the flowing, the pellicle is exposed to ionized gas generated by at least one alpha ionizer. Also during the flowing, an ultrasonic wave is applied to the pellicle using an ultrasound transducer or transducer array. The gas nozzle may have a nozzle aperture comprising a slit or a linear array of apertures arranged parallel with a pellicle membrane of the pellicle.
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