Invention Application
- Patent Title: METHOD AND SYSTEM FOR GENERATING APPLICATION-LAYER SIGNATURES CHARACTERIZING ADVANCED APPLICATION-LAYER ATTACKS
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Application No.: US18794606Application Date: 2024-08-05
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Publication No.: US20240396932A1Publication Date: 2024-11-28
- Inventor: Ehud DORON , Alon TAMIR , David AVIV
- Applicant: Radware Ltd.
- Applicant Address: IL Tel Aviv
- Assignee: Radware Ltd.
- Current Assignee: Radware Ltd.
- Current Assignee Address: IL Tel Aviv
- Main IPC: H04L9/40
- IPC: H04L9/40

Abstract:
A method and device for generating application-layer signatures characterizing advanced application-layer attacks are provided. The method includes computing, based on applicative peacetime baseline distributions and attack distributions of applicative attributes included in application-layer transactions directed to a protected entity, an attacker probability of an attacker executing an ongoing application-layer attack; comparing the attacker probability computed for each of the applicative attributes to a dynamic attacker probability threshold; and including in an application-layer signature eligible applicative attributes having an attacker probability higher than the dynamic attacker threshold, wherein the application-layer signature includes an inclusive section and an exclusive section, and wherein the application-layer signature is indicative of an ongoing attack based on one of the exclusive section and the inclusive section.
Information query