• Patent Title: METHOD AND SYSTEM FOR GENERATING APPLICATION-LAYER SIGNATURES CHARACTERIZING ADVANCED APPLICATION-LAYER ATTACKS
  • Application No.: US18794606
    Application Date: 2024-08-05
  • Publication No.: US20240396932A1
    Publication Date: 2024-11-28
  • Inventor: Ehud DORONAlon TAMIRDavid AVIV
  • Applicant: Radware Ltd.
  • Applicant Address: IL Tel Aviv
  • Assignee: Radware Ltd.
  • Current Assignee: Radware Ltd.
  • Current Assignee Address: IL Tel Aviv
  • Main IPC: H04L9/40
  • IPC: H04L9/40
METHOD AND SYSTEM FOR GENERATING APPLICATION-LAYER SIGNATURES CHARACTERIZING ADVANCED APPLICATION-LAYER ATTACKS
Abstract:
A method and device for generating application-layer signatures characterizing advanced application-layer attacks are provided. The method includes computing, based on applicative peacetime baseline distributions and attack distributions of applicative attributes included in application-layer transactions directed to a protected entity, an attacker probability of an attacker executing an ongoing application-layer attack; comparing the attacker probability computed for each of the applicative attributes to a dynamic attacker probability threshold; and including in an application-layer signature eligible applicative attributes having an attacker probability higher than the dynamic attacker threshold, wherein the application-layer signature includes an inclusive section and an exclusive section, and wherein the application-layer signature is indicative of an ongoing attack based on one of the exclusive section and the inclusive section.
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