Invention Application
- Patent Title: SEMICONDUCTOR DEVICE WITH INCREASED UNIT DENSITY
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Application No.: US18789448Application Date: 2024-07-30
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Publication No.: US20240397697A1Publication Date: 2024-11-28
- Inventor: You-Cheng XIAO , Jhih-Siang HU , Ru-Yu WANG , Jung-Hsuan CHEN , Ting-Wei CHIANG
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Main IPC: H10B10/00
- IPC: H10B10/00 ; H01L23/528

Abstract:
A semiconductor device includes at least one memory cell and at least one logic cell. The at least one logic cell is disposed next to the at least one memory cell. The at least one logic cell includes fins. The fins are separated into fin groups for forming transistors. A distance between two adjacent groups of the plurality of fin groups is different from a distance between another two adjacent groups of the plurality of fin groups.
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