Invention Application
- Patent Title: BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, LAMINATE, AND MANUFACTURING METHOD OF METAMATERIAL
-
Application No.: US18804139Application Date: 2024-08-14
-
Publication No.: US20240402569A1Publication Date: 2024-12-05
- Inventor: Yasuyuki SASADA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2022-030214 20220228
- Main IPC: G02F1/355
- IPC: G02F1/355 ; G02B1/00 ; G02B1/04
Abstract:
Provided are a base material for a metamaterial, in which a thermal dimensional change rate in a case of being allowed to stand in an environment of 90° C. for 24 hours is 0.01% or more and less than 10%; a metamaterial and a laminate including the base material for a metamaterial; and a manufacturing method of a metamaterial.
Information query
