Invention Application
- Patent Title: FLOW RATE CONTROL DEVICE
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Application No.: US18386779Application Date: 2023-11-03
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Publication No.: US20240410490A1Publication Date: 2024-12-12
- Inventor: Takahiro KAWAMOTO , Hiroyoshi AMANO , Taichi BABA , Kurumi CHINO
- Applicant: TOFLO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOFLO CORPORATION
- Current Assignee: TOFLO CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2023-094539 20230608
- Main IPC: F16K31/04
- IPC: F16K31/04 ; F16K11/072

Abstract:
Provided is a flow rate control device capable of suppressing variation of supply pressure caused by variation of set flow rate and suppressing influence of pressure loss and cavitation on a secondary side. The flow rate control device (18) includes: a flow rate regulating valve (19) that regulates a flow rate of fluid flowing in a flow path; a flow meter (20) that measures the flow rate of the fluid flowing in the flow path; and a control portion (21) that controls an opening degree of the flow rate regulating valve (19) based on a measurement result of the flow meter (20), the flow rate regulating valve (19) is a three-way valve for dividing to regulate fluid flowing in from an inflow port (24) to a first outflow port (25) and a second outflow port (26), the flow meter (20) is connected to the second outflow port (26) side, and a multistage throttle orifice (22) for decompressing the pressure of the fluid in stages is provided on the first outflow port (25) side.
Information query