Invention Application
- Patent Title: BETA GALLIUM OXIDE SUBSTRATE MANUFACTURING METHOD
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Application No.: US18765505Application Date: 2024-07-08
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Publication No.: US20250033245A1Publication Date: 2025-01-30
- Inventor: Yuya SETO
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2023-119568 20230724
- Main IPC: B28D5/00
- IPC: B28D5/00 ; B23K26/364

Abstract:
A β gallium oxide substrate manufacturing method for manufacturing a substrate from a workpiece formed of β gallium oxide includes a separation layer forming step of applying a laser beam of such a wavelength as to be transmitted through the β gallium oxide to the workpiece, with a focal point of the laser beam positioned at a predetermined depth from a front surface of the workpiece, to thereby form a separation layer including a modified part and a crack extending from the modified part, inside the workpiece, and a separation step of exerting an external force on the workpiece to thereby separate the substrate from the workpiece with the separation layer as a start point, after the separation layer forming step.
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