Invention Application
- Patent Title: APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION
-
Application No.: US18652444Application Date: 2024-05-01
-
Publication No.: US20250093784A1Publication Date: 2025-03-20
- Inventor: DAIKI MINAMI , JINJOO KIM , HYUNJI SONG , JI YOUNG PARK , SEUNGYEOL BAEK
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR SUWON-SI
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR SUWON-SI
- Priority: KR10-2023-0123041 20230915
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/40 ; G06F30/20

Abstract:
An apparatus includes a processor, a memory electrically connected to the processor and that stores instructions, and a storage unit that stores a photoresist molecular model, a surfactant molecular model, an additive molecular model and a solvent molecular model. The processor is configured by the instructions to perform a molecular dynamics simulation of a cell in which are placed photoresist molecules based on the photoresist molecular model, surfactant molecules based on the surfactant molecular model, additive molecules based on the additive molecular model, and solvent molecules based on the solvent molecular model, and compute a number of first surfactant molecules located in the cell in a vicinity of an interface between a photoresist pattern that includes the photoresist molecules and a solvent that includes the solvent molecules, and a number of second surfactant molecules located in the cell in a vicinity of a surface of the solvent.
Information query