Invention Application
- Patent Title: REMOTE PLASMA SOURCE
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Application No.: US18896265Application Date: 2024-09-25
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Publication No.: US20250118538A1Publication Date: 2025-04-10
- Inventor: Kartik RAMASWAMY , Mehran MOALEM , Farhad MOGHADAM , Eller Y. JUCO
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
Some embodiments are directed to a remote plasma system. The remote plasma system may include: a first tube; a second tube; a first isolation component coupled between a first end of the first tube and a first end of the second tube; a second isolation component coupled between a second end of the first tube and a second end of the second tube; and a first capacitive element coupled to the first isolation component.
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