发明授权
- 专利标题： Method for forming protective film by ionic plating
- 专利标题（中）： 通过离子电镀形成保护膜的方法
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申请号： US50312574申请日： 1974-09-04
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公开(公告)号： US3928159A公开(公告)日： 1975-12-23
- 发明人: TADOKORO EIICHI , KITAMOTO TATSUJI
- 申请人： FUJI PHOTO FILM CO LTD
- 专利权人： FUJIFILM Corp
- 当前专利权人： FUJIFILM Corp
- 优先权： JP9964273 1973-09-04
- 主分类号： C23C14/32
- IPC分类号： C23C14/32 ; G11B5/64 ; G11B5/72 ; C23C15/00 ; C11B5/00
摘要：
In a method for formation of a protective film on a magnetic recording substance by ionic plating comprising generating a glow discharge of nitrogen or an inert gas at a vacuum of from about 1 X 10 1 mmHg to 1 X 10 5 mmHg between a magnetic recording substance as a substrate and at least one metal selected from the group consisting of the Group IB, Group IIB, Group VIB, Group VIIB and Group VIIIB metals as the evaporative source, and applying a voltage to the substrate and the evaporative source so that the electric potential of the substrate is more negative than the electric potential of the evaporative source.
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