发明授权
- 专利标题: Block copolyesters of polysiloxanes
- 专利标题(中): 聚硅氧烷的嵌段共聚酯
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申请号: US508800申请日: 1974-09-24
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公开(公告)号: US3935154A公开(公告)日: 1976-01-27
- 发明人: John Duval Cawley
- 申请人: John Duval Cawley
- 申请人地址: NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: NY Rochester
- 主分类号: C08G63/695
- IPC分类号: C08G63/695 ; C08G77/445 ; C08L83/10 ; G03G5/05 ; G03G13/28 ; C08K5/02
摘要:
Solvent soluble block copolyesters consisting essentially of units having the formula: ##EQU1## WHEREIN R is an alkylene radical containing at least 3 carbon atoms; R.sup.1 is an alkyl radical and R.sup.2 is an alkyl, alkaryl, aralkyl or aryl radical; A is an alkylene or arylene radical; a is an integer of at least 10; b is an integer of at least 1; c is an integer of at least 2; and d is an integer of at least 2; are formed by first reacting a dihalo-polydiorganosiloxane with a dihydric phenol or other diol and subsequently reacting the resulting reaction product with a dicarboxylic acid halide. These polymers are useful as release agents and leveling agents and find particular utility as abhesive materials for waterless lithographic printing plates.
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