发明授权
- 专利标题: Highly sensitive process for measuring fine deformation
- 专利标题(中): 用于测量精细变形的高灵敏度过程
-
申请号: US567286申请日: 1974-09-19
-
公开(公告)号: US3985444A公开(公告)日: 1976-10-12
- 发明人: Matsuo Takashima , Minoru Ohtsuka , Kazuya Matsumoto
- 申请人: Matsuo Takashima , Minoru Ohtsuka , Kazuya Matsumoto
- 申请人地址: JA Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JA Tokyo
- 优先权: JA46-81341 19711016
- 主分类号: G01B11/16
- IPC分类号: G01B11/16 ; G01B9/02
摘要:
A highly sensitive process for measuring fine deformation comprises a stage of illumination with beam to on a periodic structure having diffractive function as well as lacking in diffractive function, a stage of selecting wave of diffraction order having conjugate or nearly conjugate relation among diffracted wave fronts projected from the periodic structure by means of said illumination with beam so as to cause mutual interference, thus, the amount of deformation is measured by the interference fringe formed by said mutual interference when the basic period of periodic structure is displaced or periodic structure is deformed.
公开/授权文献
- US3977241A Actuator unit for vehicle brake testing 公开/授权日:1976-08-31