发明授权
- 专利标题: Apparatus for stabilizing beam for exposure
- 专利标题(中): 用于稳定曝光的光束的装置
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申请号: US699068申请日: 1976-06-23
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公开(公告)号: US4068197A公开(公告)日: 1978-01-10
- 发明人: Taro Yamazaki , Kazuhiko Ohnishi , Kiyoshi Maeda
- 申请人: Taro Yamazaki , Kazuhiko Ohnishi , Kiyoshi Maeda
- 申请人地址: JA Kyoto JA Tokyo
- 专利权人: Dainippon Screen Seizo Kabushiki-Kaisha,Ushio Electric Inc.
- 当前专利权人: Dainippon Screen Seizo Kabushiki-Kaisha,Ushio Electric Inc.
- 当前专利权人地址: JA Kyoto JA Tokyo
- 优先权: JA50-79567 19750626
- 主分类号: G02B26/10
- IPC分类号: G02B26/10 ; G02F1/11 ; G03F3/08 ; G06K15/12 ; H04N1/23 ; H04N1/40 ; H01S3/00
摘要:
An apparatus for stabilizing a laser beam to be used for exposure in an image-reproducing apparatus wherein said beam is suitably controlled by image signals obtained from the scanning of the original beam as modulated. A laser beam, after being suitably modulated by an ultrasonic light modulator, is branched out by a half mirror into two beams, one of which is to be used for exposing a photosensitive material and the other is used as a negative feedback signal. This feedback signal is then added to an image signal so that a linearity between exposing beam and image signals are greatly improved. Further, by improving the linearity of exposing beam, the stability of the exposing beam is simultaneously improved.
公开/授权文献
- US5784577A Automated control system for programming PLDs 公开/授权日:1998-07-21
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